|ITEM METADATA RECORD
|Title: ||Megasonic, non-contact cleaning followed by "Rotagoni" drying of CMP wafers|
|Authors: ||Lauerhaas, Jeff|
|Issue Date: ||2000 |
|Conference: ||5th International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS2000); 18-20 September 2000; Oostende, Belgium.|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Clinical Residents Medicine|
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