Title: Single wafer cleaning and drying: particle removal via a non-contact, non-damaging megasonic clean followed by a high performance "Rotagoni" dry
Authors: Lauerhaas, Jeff ×
Mertens, Paul
Fyen, Wim
Kenis, Karine
Meuris, Marc
Nicolosi, T
Bran, M
Fraser, B
Franklin, C
Wu, Y
Heyns, Marc #
Issue Date: 2000
Host Document: pages:157-160
Conference: Proceedings of the 9th International Symposium on Semiconductor Manufacturing - ISSM; September 2000; Tokyo, Japan.
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Clinical Residents Medicine
Surface and Interface Engineered Materials
× corresponding author
# (joint) last author

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