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Title: Co-implantation with conventional spike anneal solutions for 45 nm n-type metal-oxide-semiconductor ultra-shallow junction formation
Authors: Collart, E.J.H ×
Felch, S.B
Pawlak, Bartek
Absil, Philippe
Severi, Simone
Janssens, Tom
Vandervorst, Wilfried #
Issue Date: Jan-2006
Publisher: Published for the Society by the American Institute of Physics
Series Title: Journal of Vacuum Science & Technology B, Microelectronics and Nanometer Structures vol:24 issue:1 pages:507-509
ISSN: 1071-1023
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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