Title: Characterization of WF6/N2/H2 plasma enhanced chemical vapor deposited WxN films as barriers for Cu metallization
Authors: Li, Hua ×
Jin, S
Bender, Hugo
Lanckmans, Filip
Heyvaert, Ilse
Maex, Karen
Froyen, Ludo #
Issue Date: 2000
Series Title: Journal of Vacuum Science & Technology B, Microelectronics and Nanometer Structures vol:B18 issue:1 pages:242-251
ISSN: 1071-1023
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
Physical Metallurgy and Materials Engineering Section (-)
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science