This item still needs to be validated !
Title: Silicide induced mechanical stress in Si: what are the consequences for MOS technology
Authors: Maex, Karen
Steegen, An #
Issue Date: 2000
Host Document: pages:143-149
Conference: Thin Films - Stresses and Mechanical Properties VIII; November 29 - December 3, 1999, Boston, MA, USA.
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science