|ITEM METADATA RECORD
|Title: ||Comprehensive electromigration studies of dual-damascene Cu interconnects with ALD WCxNy barriers|
|Authors: ||Bruynseraede, Christophe ×|
Maex, Karen #
|Issue Date: ||2004 |
|Conference: ||Proceedings of the IEEE International Interconnect Technology Conference location:San Francisco, CA, USA date:07/06/04|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
× corresponding author|
# (joint) last author|
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