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Title: Atomic layer deposited barriers for copper interconnects
Authors: Schuhmacher, Jorg ×
Martin Hoyas, Ana
Ernur, Didem
Tokei, Zsolt
Travaly, Youssef
Bruynseraede, Christophe
Satta, Alessandra
Whelan, Caroline
Shamiryan, Denis
Beyer, Gerald
Abell, Thomas
Sutcliffe, Victor
Schaekers, Marc
Maex, Karen #
Issue Date: 2004
Conference: AVS 51 International Symposium location:Annheim, CA, USA date:14/11/04
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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