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Title: Nanometer scale characterisation of CoSi2 and NiSi induced strain in silicon by convergent beam electron diffraction
Authors: Benedetti, Alessandro ×
Bender, Hugo
Torregiani, Cristina
Van Dal, Mark
Maex, Karen #
Issue Date: 2004
Series Title: Materials Science and Engineering B vol:114-115 pages:61-66
ISSN: 0921-5107
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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