Title: Electromigration-induced drift in damascene and plasma-etched Al(Cu). II: Mass transport mechanisms in bamboo interconnects
Authors: Proost, Joris ×
Maex, Karen
Delaey, Lucas #
Issue Date: 2000
Publisher: American Institute of Physics
Series Title: Journal of Applied Physics vol:87 issue:1 pages:99-109
ISSN: 0021-8979
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Department of Materials Engineering - miscellaneous
Physical Metallurgy and Materials Engineering Section (-)
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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