Title: Electromigration-induced drift in damascene and plasma-etched Al(Cu). I: Kinetics of Cu depletion in polycrystalline interconnects
Authors: Proost, Joris ×
Witvrouw, Ann
Maex, Karen
D'Haen, Jan
Cosemans, P #
Issue Date: 2000
Publisher: American Institute of Physics
Series Title: Journal of Applied Physics vol:87 issue:1 pages:86-98
ISSN: 0021-8979
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Department of Materials Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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