|ITEM METADATA RECORD
|Title: ||Stress Reduction in Tungsten CVD Films by RTA Post-Treatment of Ti/TiN Bilayers in Ammonia|
|Authors: ||Palmans, Roger|
Zhang, S. L
|Issue Date: ||1995 |
|Conference: ||Conference on Advanced Metallization and Interconnect Systems for ULSI Applications; October 3-5, 1995; Portland, Oregon, USA.|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
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