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Title: Barrier reliability of ALD TaN on sub-100 nm copper low-k interconnects
Authors: Tokei, Zsolt ×
Gailledrat, Thomas
Li, Yunlong
Schuhmacher, Jorg
Mandrekar, T
Guggilla, S
Mebarki, Bencherki
Maex, Karen #
Issue Date: 2005
Publisher: MRS
Conference: Adanced Metallization Conference 2004 location:San Diego, CA, USA date:19/10/04
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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