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|ITEM METADATA RECORD
|Title: ||Barrier reliability of ALD TaN on sub-100 nm copper low-k interconnects|
|Authors: ||Tokei, Zsolt ×|
Maex, Karen #
|Issue Date: ||2005 |
|Conference: ||Adanced Metallization Conference 2004 location:San Diego, CA, USA date:19/10/04|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Electrical Engineering - miscellaneous|
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author|
# (joint) last author|
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