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Title: Properties of TiN thin films deposited by ALCVD as barriers for Cu metallization
Authors: Satta, Alessandra
Beyer, Gerald
Maex, Karen
Elers, K
Haukka, S
Vantomme, André
Issue Date: 2000
Conference: MRS Spring Meeting 2000. Symposium D: Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics; 2
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
Physics and Astronomy - miscellaneous
Nuclear and Radiation Physics Section

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