Title: Atomic concentration profiling of nitrided HfSiO thin layers: a major challenge for physical analysis
Authors: Conard, Thierry
Franquet, Alexis
Vandervorst, Wilfried
Mack, P
Werner, M
Van den Berg, J.A
Hombourger, C
Issue Date: 2006
Conference: E-MRS IUMRS ICEM 2006 Spring Meeting Symposium L: Characterization of High-k Dielectric Materials location:Leuven Belgium date:29/05/06
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Electrical Engineering - miscellaneous

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