|ITEM METADATA RECORD
|Title: ||Atomic concentration profiling of nitrided HfSiO thin layers: a major challenge for physical analysis|
|Authors: ||Conard, Thierry|
Van den Berg, J.A
|Issue Date: ||2006 |
|Conference: ||E-MRS IUMRS ICEM 2006 Spring Meeting Symposium L: Characterization of High-k Dielectric Materials location:Leuven Belgium date:29/05/06|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Electrical Engineering - miscellaneous|
|Files in This Item:
There are no files associated with this item.
Request a copy
All items in Lirias are protected by copyright, with all rights reserved.