|ITEM METADATA RECORD
|Title: ||HfSiO(N) composition depth profiling: can we get a quantitative answer using SIMS?|
|Authors: ||Conard, Thierry ×|
Van Elshocht, S
Lehnen, P #
|Issue Date: ||2006 |
|Conference: ||SIMS Europe: 5th European Workshop on Secondary Ion Mass Spectrometry location:Leuven Belgium date:24/09/06|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Electrical Engineering - miscellaneous|
× corresponding author|
# (joint) last author|
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