|ITEM METADATA RECORD
|Title: ||CoSi2 formation using a Ti capping layer - influence of processing conditions on CoSi2 nucleation|
|Authors: ||Detavernier, C|
Van Meirhaeghe, R
|Issue Date: ||2001 |
|Conference: ||Symposium K of the MRS Spring Meeting: Gate Stack and Silicide Issues in Si Processing II; 16-20 April 2001; San Francisco, CA,|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
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