Title: CoSi2 formation using a Ti capping layer - influence of processing conditions on CoSi2 nucleation
Authors: Detavernier, C
Van Meirhaeghe, R
Maex, Karen
Issue Date: 2001
Conference: Symposium K of the MRS Spring Meeting: Gate Stack and Silicide Issues in Si Processing II; 16-20 April 2001; San Francisco, CA,
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems

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