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Title: Integration of Cu and low-K dielectrics: effect of hard mask and dry etch on electrical performance of damascene structures
Authors: Donaton, R. A ×
Coenegrachts, Bart
Maenhoudt, Mireille
Pollentier, Ivan
Struyf, Herbert
Vanhaelemeersch, Serge
Vos, Ingrid
Meuris, Marc
Fyen, Wim
Beyer, Gerald
Tokei, Zsolt
Stucchi, Michele
Vervoort, Iwan
De Roest, David
Maex, Karen #
Issue Date: 2001
Series Title: Microelectronic Engineering vol:55 issue:01/04/07 pages:277-283
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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