Title: EFTEM study of plasma etched low-k Si-O-C dielectrics
Authors: Hens, S ×
Bender, Hugo
Donaton, R. A
Maex, Karen
Vanhaelemeersch, Serge
Van Landuyt, J #
Issue Date: 2001
Publisher: IOP
Host Document: pages:415-418
Conference: Microscopy of Semiconducting Materials - MSMXII location:Antwerpen Belgium date:25/03/01
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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