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Title: Selective epitaxy of Si/SiGe to improve pMOS devices by recessed source/drain and/or buried SiGe channels
Authors: Loo, Roger ×
Walczyk, Christian
Verheyen, Peter
Rooyackers, Rita
Leys, Frederik
Eneman, Geert
Shamiryan, Denis
Absil, Philippe
Delande, Tinne
Moussa, Alain
Bender, Hugo
Drijbooms, Chris
Geenen, Luc
Caymax, Matty
Weijtmans, H
Wise, R
Machkaoutsan, Vladimir
Tomasini, P
Arena, C
McCormack, J
Passefort, Sophie
Sorada, Haruyuki
Inoue, Akira
Lee, Byeong Chan
Hyun, Sangjin
Jakschik, S
Godny, S #
Issue Date: 2006
Publisher: ECS
Host Document: pages:453-465
Conference: SiGe and Ge: Materials, Processes, and Devices location:Leuven Belgium date:29/10/06
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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