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Title: Addressing key concerns for implementation of Ni FUSI into manufacturing for 45/32 nm CMOS
Authors: Shickova, Adelina ×
Kauerauf, Thomas
Rothschild, Aude
Aoulaiche, Marc
Sahhaf, Sahar
Kaczer, Ben
Veloso, Anabela
Torregiani, Cristina
Pantisano, Luigi
Lauwers, Anne
Zahid, Mohammed
Rost, Tim
Tigelaar, H
Pas, M
Fretwell, J
McCormack, J
Hoffmann, Thomas
Kerner, Christoph
Chiarella, Thomas
Brus, Stephan
Harada, Yoshinao
Niwa, Masaaki
Kaushik, Vidya
Maes, Herman
Absil, Philippe
Groeseneken, Guido
Biesemans, Serge
Kittl, Jorge #
Issue Date: 2007
Publisher: IEEE
Host Document: pages:158-159
Conference: Symposium on VLSI Technology Digest of Technical Papers location:Leuven Belgium date:14/06/07
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
ESAT - MICAS, Microelectronics and Sensors
× corresponding author
# (joint) last author

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