|ITEM METADATA RECORD
|Title: ||SiON ARC: Material characterization and implication in lithographic process|
|Authors: ||Zhang, Fenghong ×|
Ronse, Kurt #
|Issue Date: ||2000 |
|Host Document: ||pages:191-200|
|Conference: ||Proceedings Interface - Arch Microlithography Symposium; November 5-7, 2000; San Diego, CA, USA.|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Electrical Engineering - miscellaneous|
× corresponding author|
# (joint) last author|
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