Title: SiON ARC: Material characterization and implication in lithographic process
Authors: Zhang, Fenghong ×
Pollentier, Ivan
Eliat, Astrid
Delvaux, Christie
Ronse, Kurt #
Issue Date: 2000
Host Document: pages:191-200
Conference: Proceedings Interface - Arch Microlithography Symposium; November 5-7, 2000; San Diego, CA, USA.
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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