Title: The kinetics and mechanism of the etching of CoSi2 in HF-based solutions
Authors: Baklanov, Mikhaïl ×
Badmaeva, I. A
Donaton, R. A
Sveshnikova, L. L
Storm, Wolfgang
Maex, Karen #
Issue Date: 1996
Series Title: Journal of the Electrochemical Society vol:143 pages:3245-3251
ISSN: 0013-4651
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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