|ITEM METADATA RECORD
|Title: ||Accurate determination of channel length, series resistance and junction doping profile for MOSFET optimisation in deep submicron technologies|
|Authors: ||Biesemans, Serge ×|
De Meyer, Kristin #
|Issue Date: ||1996 |
|Conference: ||VLSI Symposium 1996. Technical Digest; June 1996; Honolulu, Hawai,USA. location:Leuven Belgium|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
× corresponding author|
# (joint) last author|
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