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Title: A comparative study of copper drift diffusion in plasma deposited a-SiC : H and Silicon Nitride
Authors: Lanckmans, Filip ×
Gray, William
Brijs, Bert
Maex, Karen #
Issue Date: 2001
Series Title: Microelectronic Engineering vol:55 issue:01/04/07 pages:329-335
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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