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|ITEM METADATA RECORD
|Title: ||Dielectric quality and reliability of FUSI/HfSiON devices with process induced strain|
|Authors: ||Shickova, Adelina ×|
Groeseneken, Guido #
|Issue Date: ||2007 |
|Series Title: ||Microelectronic Engineering vol:84 issue:9-10 pages:1906-1909|
|Publication status: ||published|
|KU Leuven publication type: ||IT|
|Appears in Collections:||Electrical Engineering - miscellaneous|
Associated Section of ESAT - INSYS, Integrated Systems
ESAT - MICAS, Microelectronics and Sensors
× corresponding author|
# (joint) last author|
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