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Title: Scaling of HF-based gate dielectrics - intgeration with polysilicon gates
Authors: De Gendt, Stefan
Caymax, Matty
Chen, J
Claes, Martine
Conard, Thierry
Delabie, Annelies
Deweerd, Wim
Kaushik, Vidya
Kerber, Andreas
Kubicek, Stefan
Niwa, M
Pantisano, Luigi
Puurunen, Riikka
Ragnarsson, Lars-Ake
Schram, Tom
Shimamoto, Yasuhiro
Tsai, Wilman
Rohr, Erika
Van Elshocht, Sven
Vandervorst, Wilfried
Witters, Thomas
Young, Edward
Zhao, Chao
Heyns, Marc #
Issue Date: 2004
Publisher: ECS
Host Document: pages:267-275
Conference: Physics and Technology of High-k Gate Dielectrics II location:Leuven Belgium date:12/10/03
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
Molecular Design and Synthesis
# (joint) last author

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