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Title: Charge trapping and electron mobility degradation in MOCVD hafnium silicate gate dielectric stack structures
Authors: Young, C.D ×
Kerber, Andreas
Hou, T.H
Cartier, Eduard
Brown, G.A
Bersuker, G
Kim, Y
Lim, C
Gutt, J
Lysaght, P
Bennett, J
Lee, C.H
Gopalan, S
Gardner, M
Zeitzoff, P
Groeseneken, Guido
Murto, R.W
Huff, H.R #
Issue Date: 2004
Publisher: ECS
Host Document: pages:347-359
Conference: Physics and Technology of High-k Gate Dielectrics II location:Austin,TX USA date:12/10/03
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
ESAT - MICAS, Microelectronics and Sensors
× corresponding author
# (joint) last author

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