This item still needs to be validated !
|ITEM METADATA RECORD
|Title: ||Characterization of AlCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy|
|Authors: ||Nohira, Hiroshi|
De Gendt, Stefan
|Issue Date: ||2001 |
|Conference: ||Symposium Q of the E-MRS Spring Meeting 2001: High-k Gate Dielectrics; June 5-8, 2001; Strasbourg, France. location:Leuven Belgium|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Faculty of Engineering Science - miscellaneous|
Electrical Engineering - miscellaneous
|Files in This Item:
There are no files associated with this item.
Request a copy
All items in Lirias are protected by copyright, with all rights reserved.
© Web of science