Title: Transient enhanced diffusion of Boron in Si
Authors: Jain, Suresh ×
Schoenmaker, Wim
Lindsay, Richard
Stolk, Peter
Decoutere, Stefaan
Willander, M
Maes, Herman #
Issue Date: 2002
Publisher: American Institute of Physics
Series Title: Journal of Applied Physics vol:91 issue:11 pages:8919-8941
ISSN: 0021-8979
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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