Title: Comparative study of drain and gate low-frequency noise in nMOSFETs with hafnium-based gate dielectrics
Authors: Giusi, G ×
Crupi, F
Pace, C
Ciofi, C
Groeseneken, Guido #
Issue Date: 2006
Series Title: IEEE Transactions on Electron Devices vol:53 issue:4 pages:823-828
ISSN: 0018-9383
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
ESAT - MICAS, Microelectronics and Sensors
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science