Title: Stress in silicon due to the formation of self aligned poly-CoSi2 lines studied by micro-Raman spectroscopy
Authors: Howard, Dave ×
De Wolf, Ingrid
Bender, Hugo
Maex, Karen #
Issue Date: 1996
Host Document: pages:251-6
Conference: Silicide Thin Films - Fabrication, Properties, and Applications; 27-30 Nov. 1996; Boston, MA, USA. location:Leuven Belgium
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science