This item still needs to be validated !
|ITEM METADATA RECORD
|Title: ||Enhancement of AlCVD TiN growth on Si-O-C and a-SiC:H films by O2-based plasma treatments|
|Authors: ||Satta, Alessandra|
Elers, K. E
|Issue Date: ||2001 |
|Conference: ||MAM European Workshop; 5-7 March 2001; Sigtuna, Sweden.|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Physics and Astronomy - miscellaneous|
Nuclear and Radiation Physics Section
Associated Section of ESAT - INSYS, Integrated Systems
|Files in This Item:
There are no files associated with this item.
Request a copy
All items in Lirias are protected by copyright, with all rights reserved.