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Title: Properties of TiN thin films deposited by ALCVD as barriers for Cu metallization
Authors: Satta, Alessandra ×
Beyer, Gerald
Maex, Karen
Elers, K
Haukka, S
Vantomme, André #
Issue Date: 2001
Publisher: MRS
Host Document: pages:D6.5.1-D6.5.6
Conference: Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics date:23/04/00
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Physics and Astronomy - miscellaneous
Nuclear and Radiation Physics Section
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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