Title: Improvement of high temperature water rinsing and drying for HF-last wafer cleaning
Authors: Li, Li ×
Bender, Hugo
Zou, Gang
Mertens, Paul
Meuris, Marc
Heyns, Marc #
Issue Date: 1996
Series Title: Journal of the Electrochemical Society vol:143 pages:233-237
ISSN: 0013-4651
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Clinical Residents Medicine
Surface and Interface Engineered Materials
× corresponding author
# (joint) last author

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