Title: Modification of low-k SiCOH film porosity by a HF solution
Authors: Shamiryan, Denis ×
Baklanov, Mikhaïl
Vereecke, Guy
Vanhaelemeersch, Serge
Maex, Karen #
Issue Date: 2001
Host Document: pages:135-138
Conference: Ultra Clean Processing of Silicon Surfaces 2000; Proceedings of the 5th International Conference held in Ostend, Belgium, Septem
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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