Title: Silicide-induced stress in Si: origin and consequences for MOS technologies
Authors: Steegen, An ×
Maex, Karen #
Issue Date: 2002
Publisher: Elsevier Sequoia
Series Title: Materials Science & Engineering R, Reports vol:38 issue:1 pages:1-53
ISSN: 0927-796X
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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