Title: Study of the reliability impact of chlorine precursor residues in thin atomic-layer-deposited HfO2 layers
Authors: Cho, Moonju ×
Degraeve, Robin
Pourtois, Geoffrey
Delabie, Annelies
Ragnarsson, Lars-Ake
Kauerauf, Thomas
Groeseneken, Guido
De Gendt, Stefan
Heyns, Marc
Hwang, Cheol Seong #
Issue Date: Apr-2007
Series Title: IEEE Transactions on Electron Devices vol:54 issue:4 pages:752-758
ISSN: 0018-9383
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
Molecular Design and Synthesis
Department of Materials Engineering - miscellaneous
ESAT - MICAS, Microelectronics and Sensors
× corresponding author
# (joint) last author

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