Title: Nitrogen incorporation in HfSiO(N)/TaN gate stacks: impact on performances and NBTI
Authors: Aoulaiche, Marc ×
Houssa, Michel
Deweerd, Wim
Trojman, Lionel
Conard, Thierry
Maes, J.
De Gendt, Stefan
Groeseneken, Guido
Heyns, Marc #
Issue Date: Jul-2007
Publisher: Institute of Electrical and Electronics Engineers
Series Title: IEEE Electron Device Letters vol:28 issue:7 pages:613-615
ISSN: 0741-3106
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
Molecular Design and Synthesis
Semiconductor Physics Section
Department of Materials Engineering - miscellaneous
ESAT - MICAS, Microelectronics and Sensors
× corresponding author
# (joint) last author

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