Title: Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film
Authors: Travaly, Youssef ×
Eyckens, Brenda
Carbonell, Laure
Rothschild, Aude
Le, Quoc Toan
Brongersma, Sywert
Ciofi, Ivan
Struyf, Herbert
Furukawa, Yukiko
Stucchi, Michele
Schaekers, Marc
Bender, Hugo
Rosseel, Erik
Vanhaelemeersch, Serge
Maex, Karen
Gaillard, F
Van Autryve, Luc
Rabinzohn, P #
Issue Date: 2002
Series Title: Microelectronic Engineering vol:64 issue:01/04/07 pages:367-374
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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