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Title: Resistivity of ultra-narrow Cu interconnects fabricated with electron beam lithography
Authors: Wu, Wen
Jonckheere, Rik
Tokei, Zsolt
Stucchi, Michele
Struyf, Herbert
Vos, Ingrid
Bender, Hugo
Maex, Karen
Issue Date: 2002
Conference: Advanced Metallization Conference location:San Diego, CA, USA date:01/10/02
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems

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