Title: Precursor penetration and sealing for CVD SiCOH low k dielectric during atomic layer deposition of WCN barrier
Authors: Abell, Thomas
Shamiryan, Denis
Schuhmacher, Jörg
Besling, W
Sutcliffe, Victor
Maex, Karen
Issue Date: 2002
Conference: Advanced Metallization Conference location:San Diego, CA, USA date:01/10/02
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems

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