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|ITEM METADATA RECORD
|Title: ||Integration of atomic layer deposition barriers in single and dual damascene oxide modules|
|Authors: ||Schuhmacher, Jörg|
|Issue Date: ||2002 |
|Conference: ||Advanced Metallization Conference location:San Diego, CA, USA date:01/10/02|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
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