|ITEM METADATA RECORD
|Title: ||Feasability of TiSi2 and CoSi2 for sub quarter micron processes|
|Authors: ||Vanhaelemeersch, Serge|
|Issue Date: ||1996 |
|Conference: ||International Conference on Advanced Metallization and Interconnect Systems for ULSI Applications; October 1996; Boston, Mass..U location:Leuven Belgium|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
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