Title: Comparative study of SiOCH low-k films with varied porosity interacting with etching and cleaning plasma
Authors: Shamiryan, Denis ×
Baklanov, Mikhaïl
Vanhaelemeersch, Serge
Maex, Karen #
Issue Date: 2002
Series Title: Journal of Vacuum Science & Technology B vol:20 issue:5 pages:1923-1928
ISSN: 1071-1023
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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