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Title: Tall triple-gate device with TiN/HfO2 gate stack
Authors: Collaert, Nadine ×
Demand, Marc
Ferain, Isabelle
Lisoni, Judit
Singanamalla, Raghunath
Zimmerman, Paul
Yim, Yong Sik
Schram, Tom
Mannaert, Geert
Goodwin, Michael
Hooker, Jacob
Neuilly, Francois
Kim, Myeong-Cheol
De Meyer, Christina
De Gendt, Stefan
Boullart, Werner
Jurczak, Malgorzata
Biesemans, Serge #
Issue Date: 2005
Publisher: IEEE
Host Document: pages:108-109
Conference: Symposium on VLSI Technology. Digest of Technical Papers location:Leuven Belgium date:14/06/05
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
Molecular Design and Synthesis
× corresponding author
# (joint) last author

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