This item still needs to be validated !
Title: CMP-less integration of fully Ni-silicided metal gates in FinFETs by simultaneous silicidation of the source, drain, and the gate using a novel dual hard mask approach
Authors: Kottantharayil, Anil ×
Verheyen, Peter
Collaert, Nadine
Dixit, Abhisek
Kaczer, Ben
Snow, Jim
Vos, Rita
Locorotondo, Sabrina
Degroote, Bart
Shi, Xiaoping
Rooyackers, Rita
Mannaert, Geert
Brus, Stephan
Yim, Yong Sik
Lauwers, Anne
Goodwin, Michael
Kittl, Jorge
Van Dal, Mark
Richard, Olivier
Veloso, Anabela
Kubicek, Stefan
Beckx, Stephan
Boullart, Werner
De Meyer, Christina
Absil, Philippe
Jurczak, Malgorzata
Biesemans, Serge #
Issue Date: 2005
Publisher: IEEE
Host Document: pages:198-199
Conference: Symposium on VLSI Technology. Digest of Technical Papers location:Leuven Belgium date:14/06/05
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.