Title: Manufacturability issues for application of silicides in 0.25 ?m CMOS process and beyond
Authors: Wang, Qingfeng ×
Lauwers, A
Jonckx, Franky
de Potter de ten Broeck, Muriel
Chen, Chun-Cho
Maex, Karen #
Issue Date: 1996
Host Document: pages:221-231
Conference: Silicide Thin Films - Fabrication, Properties, and Applications; 27-30 Nov. 1995; Boston, MA, USA. location:Leuven Belgium
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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