Title: Surface processes occurring on TiSi2 and CoSi2 in fluorine-based plasmas. Reactive ion etching in CF4/CHF3 plasmas
Authors: Baklanov, Mikhaïl ×
Vanhaelemeersch, Serge
Storm, Wolfgang
Kim, Young-Chang
Vandervorst, Wilfried
Maex, Karen #
Issue Date: 1997
Series Title: Journal of Vacuum Science & Technology A, Vacuum, Surfaces and Films vol:15 pages:3005-3014
ISSN: 0734-2101
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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