|ITEM METADATA RECORD
|Title: ||Process and device design influence on the ESD performance of a fully silicided 0.25mm CMOS technology|
|Authors: ||Bock, Karlheinz ×|
Deferm, Ludo #
|Issue Date: ||1997 |
|Host Document: ||pages:129-137|
|Conference: ||Proceedings of the ESD Forum; Berlin, October 1997. location:Leuven Belgium|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||ESAT - MICAS, Microelectronics and Sensors|
× corresponding author|
# (joint) last author|
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