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Title: High depth resolution characterization of the damage and annealing behaviour of ultrashallow As-implants in Si
Authors: van den Berg, J.A ×
Armour, D.G
Werner, M
Whelan, S
Vandervorst, Wilfried
Clarysse, Trudo
Collart, E.H.J
Goldberg, R.D
Bailey, P
Noakes, T.C.Q #
Issue Date: 2002
Publisher: IEEE
Host Document: pages:597-600
Conference: Proceedings 14th International Conference on Ion Implantation Technology Conference location:Salford UK date:22/09/02
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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